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Acerca del ICMM

El Instituto de Ciencia de Materiales de Madrid (ICMM) es un Instituto del Consejo Superior de Investigaciones Científicas (CSIC), perteneciente al Área de Materia.

 

Nuestra misión es generar nuevos conocimientos básicos y aplicados sobre materiales y procesos con alto valor añadido y su transferencia a los sectores productivos de ámbito local, nacional y europeo. Estamos involucrados en la formación de nuevos profesionales en la investigación en materiales, y en la diseminación del conocimiento científico.

 

Acogemos la diversidad y defendemos la Ciencia inclusiva como única Ciencia posible 

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Cursos Fronteras en Ciencia de Materiales

Congresos ICMM

Próximos Eventos

ABR15|12:00

Andreev bound states: detection and the road towards quantum technologies
Attila Geresdi  leer más

ABR22|12:00

Molecule-based magnetic heterostructures for spintronics and quantum computing
Enrique Burzurí  leer más

Integrating van der Waals materials on paper substrates for electrical and optical applications

Zhang W., Zhao Q., Munuera C., Lee M., Flores E., Rodrigues J.E.F., Ares J.R., Sanchez C., Gainza J., van der Zant H.S.J., Alonso J.A., Ferrer I.J., Wang T., Frisenda R., Castellanos-Gomez A.



Paper holds the promise to replace silicon substrates in applications like internet of things or disposable electronics that require ultra-low-cost electronic components and an environmentally friendly electronic waste management. In the last years, spurred by the abovementioned properties of paper as a substrate and the exceptional electronic, mechanical and optical properties of van der Waals (vdW) materials, many research groups have worked towards the integration of vdW materials-based devices on paper. Recently, a method to deposit a continuous film of densely packed interconnects of vdW materials on paper by simply rubbing the vdW crystals against the rough surface of paper has been presented. This method utilizes the weak interlayer vdW interactions and allows cleaving of the crystals into micro platelets through the abrasion against the paper. Here, we aim to illustrate the general character and the potential of this technique by fabricating films of 39 different vdW materials (including superconductors, semi-metals, semiconductors, and insulators) on standard copy paper. We have thoroughly characterized their optical properties showing their high optical quality: one can easily resolve the absorption band edge of semiconducting vdW materials and even the excitonic features present in some vdW materials with high exciton binding energy. We also measured the electrical resistivity for several vdW materials films on paper finding exceptionally low values, which are in some cases, orders of magnitude lower than those reported for analogous films produced by inkjet printing. We finally demonstrate the fabrication of field-effect devices with vdW materials on paper using the paper substrate as an ionic gate.

Applied Materials Today

Picture of the process employed to deposit a MoSe2 film on standard paper by mechanically rubbing MoSe2 powder against the surface of paper with a cotton swab.

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