Characterization and Growth of Thin Films

Scientists in charge:

Dr. Olga Sánchez (Tenured Scientist)

Dr. Ignacio Jiménez (Senior Scientist)

Dr. Raúl Gago (Tenured Scientist)

Technicians

Dr. Leo Álvarez (Specialized Technician)

Contact

+34 913349000 ext. 437381 / 301 / 306
+34 913349078 (direct number)

Location

Lab 301, 305 and 307

The Characterization and Growth of Thin Films service is aimed at the fabrication of thin films and coatings (including on demand materials) by means of sputtering or thermal evaporation and/or the layer characterization using a variety of techniques such as profilometry, UV-VIS-NIR, FTIR and Raman spectroscopies, 4-points Resistance measurements or Nano indentation. Annealing treatments at controlled atmosphere are also available.

Measurements and equipment

A.    Thin films deposition systems:
•    Sputtering systems:
1.    Metallization system. Cylindrical vacuum chamber with a circular magnetron sputtering source (3 in diameter) for the growth thin film metals (Al, Cu, Si, Ti, Ag…) on planar substrates.
2.    Reactive magnetron system. Cylindrical vacuum chamber with up to 3 circular planar magnetron sources (3 in diameter), working simultaneously for deposition of metallic oxides, nitrides and oxynitride thin film. DC and RF electrical sources.
Maximum size of samples for both system: 4x4 cm.
For more information, please contact with the service.

• IBAD system (Ion beam-assisted thermal evaporation).
This technique allows for the simultaneous evaporation of different elements or compounds with the bombardments of ions generated from certain gases (nitrogen or noble gases). The system used consists of a vacuum chamber inside which there are two electron beam evaporators and a Kauffman ion gun.

B. Characterization equipment’s:
1- Surface profilometer Dektak 150, from Veeco.

The profiler is an advanced thin and thick film step height measurement tool capable of measuring steps below 100 Å. It also measures samples up to six inches in dimension and up to four inches thick. The Dektak 150 allows to profile surface topography and waviness, as well as to measure surface roughness in the nanometer range. The system provides a step-height repeatability of 0.6 nm. In standard configuration, user-programmable stylus force from 1 to 15 mg allows profiling on soft or hard surfaces.

2- Optical profiler Profilm3D.
The optical profiler is a white light interferometric (WLI) profilometer system, which incorporates by default a 10x10 cm motorized stage, 500 µm piezo scanning and it is equipped with 20x and 50x objectives. The system allows non-contact wide-field measurements using different standard modes: WLI, PSI, composite WLI/PSI, and true color imaging. The resultant data captured is a 3D map of the sample surface. Profilm3D also calculates all 47 standard ASME/EUR/ISO roughness parameters.

3-    Shimadzu UV-VIS-NIR Spectrophotometer SolidSpec-3700/3700DUV.
Measurable wavelength range: 190-3300 nm. The spectrophotometer has three detectors which cover the range from ultraviolet to near-infrared. The SolidSpec enables measurement in the range of 190 nm to 2600 nm with an integrating sphere (with resin that has highly reflective characteristics in the deep ultraviolet region as the inside material) and the range of 190 nm to 3300 nm by mounting the optional Direct Detection Unit DUV (with this additional unit, the wide range from deep ultraviolet to near-infrared is now measurable).
Sample dimensions: Rectangular samples where each side is between 50- and 310-mm. Thickness less than 40 mm.
The measurement method used for solid samples can be classified as either transmission measurement, in which light that passes through the sample is measured, or reflection measurement, in which light reflected off the sample is measured. Furthermore, transmission measurement and reflection measurement can both be subdivided into various types: direct, total and diffuse measurements.

4- FTIR spectroscopy (near-specular reflectance), Varian 660 MID-NEAR IR.
The Varian 660 is a specific model of FTIR spectrometer manufactured by Varian, designed for the mid-infrared to near-infrared spectral range (400-4000 cm-1). This equipment utilizes a Fourier transform technique, where infrared light is passed through a sample, and the resulting spectrum is obtained by measuring the interference pattern of the transmitted light. We offer a wide range of substrate holders in various sizes.

5- Portable Raman confocal EZRAman-N NWAVE Optronics.
This equipment with a solid-state green laser (532 nm) and a thermoelectric-cooled CCD spectrometer with a Leica BME microscope (4× 10× and 40× objectives) is used for the characterization of samples of hydrogenated amorphous carbon, carbon nanotubes, graphene layers, boron nitride layers, and metal oxide layers, among other.
Laser power: 0-50 mW.
Wavelength range: 100-3300 cm-1.
Average spectral resolution: 7 cm-1.

6- Nanoindenter, mod. NanoTest P1, from MicroMaterials, and Berkovich indenter.
The system has up to 3 separate modules (indentation, scanning and impact). The NanoTest measures the movement of a diamond probe in contact with a surface. Force, displacement and time are recorded throughout the test. The nanoindenter allows obtaining load-unload curves with loads up to 500 mN, the hardness and Young´s modulus of thin layers with thicknesses in the order of 1 micron.

7- Emissometer Model AE1 from Devices & Service Company.
The Emissometer Model AE1 is an instrument for measuring emittance. The detector responds only to radiation heat transfer and is designed to have a voltage output that is linear with emittance. The Model AE1 measures flat surfaces as small as 5.7 to 3.8 cm across. A heat sink is provided to keep both a calibration standard and the material to be measured at the same temperature. One set of high and low emittance standards are used as working calibration standards and the other set should be stored for reference.
Output: 2.4 mV nominal, with sample emittance of 0.9 and sample temperature of 25 ºC.
Linearity: +/- 0.01 units.
Time constant: 10 seconds, nominal (time to reach 63 % of final value).

8- Low-pressure annealing treatments at controlled atmosphere.
The quartz tubular reactor has a length of 30 cm (homogeneous heating zone) and an internal diameter of approximately 6 cm, reaching temperatures up to 900 ºC. The tubular reactor can be axially displaced thanks to rails. Alumina boats in direct contact with the tube walls are used as substrate holders. Possibility of Ar, N2 and/or O2 atmospheres at controlled flow and pressure.

9- 4-point measurements resistivity.
Four-probe operation for obtaining the resistivity/sheet resistance of thin films on flat substrates with known thickness. Curves I-V. During four probe operation all four needles rise and fall normally. An air dashpot controls the velocity of needle descent and thus offers uniform contact conditions from one measurement to the next.
Load: 0-100 g applied by adjustable individual tension gauges.
Sample dimensions: Slices only, 76 mm diameter is normal maximum.
Current source: Direct current 10 nano-amperes to 999.990 nA (or 0.99999 mA) and 100 nano-amperes to 9,999,900 nA (or 9.9999 mA (x10 range)). Directly dialable on a 5-decade push-button switch.

10- Pin-on disc tribometer.
Tribological tests to evaluate both friction and wear between two contacting surfaces. It consists of a stationary disc and a pin or bolt that slides or rotates on the disc´s surface. In this test, a known load is applied to the pin, and the frictional force generated between the pin and the disc during sliding is measured. Additionally, the wear of the material on both the pin and the disc is recorded. To perform these tests, we offer different types of bolts (alumina, steel and/or tungsten carbide) in our service, depending on the hardness of the substrate.