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The Instituto de Ciencia de Materiales de Madrid (ICMM) is an institute of the Consejo Superior de Investigaciones Cientificas (CSIC) (Spanish National Research Council) founded in December 1986, that belongs to the Area of Science and Technology of Materials, one of the eight Areas in which the CSIC divides its research activities.
Our mission is to create new fundamental and applied knowledge in materials of high technological impact, their processing and their transfer to the productive sectors at local, national and European scales (the true value of materials is in their use), the training of new professionals, and the dissemination of the scientific knowledge.
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Super-Planckian Radiative Heat Transfer Juan Carlos Cuevas read more
Nonlocal Soft Plasmonics: Charged fluids in classical nanophotonics and beyond Christin David read more
2018 Nobel Prize in Physics: Electrodynamic Forces and Optical Tweezers. Its relevance in Biosciences Manuel Nieto Vesperinas, ICMM-CSIC and Ricardo Arias, IMDEA Nanociencia read more
Large birefringence and linear dichroism in TiS3 nanosheets
Nikos Papadopoulos, Riccardo Frisenda, Robert Biele, Eduardo Flores, Jose R. Ares,de Carlos Sánchez, Herre S. J. van der Zant, Isabel J. Ferrer, Roberto D'Agosta and Andres Castellanos-Gomez
TiS3 nanosheets have proven to be promising candidates for ultrathin optoelectronic devices due to their direct narrow band-gap and the strong light–matter interaction. In addition, the marked in-plane anisotropy of TiS3is appealing for the fabrication of polarization sensitive optoelectronic devices. Herein, we study the optical contrast of TiS3 nanosheets of variable thickness on SiO2/Si substrates, from which we obtain the complex refractive index in the visible spectrum. We find that TiS3 exhibits very large birefringence, larger than that of well-known strong birefringent materials like TiO2 or calcite, and linear dichroism. These findings are in qualitative agreement with ab initio calculations that suggest an excitonic origin for the birefringence and linear dichroism of the material.
Mapping the color of TiS3 flakes to their thickness. (a) Optical image of an exfoliated thin flake of TiS3 on 90 nm SiO2/Si substrate. (b) AFM topography of the same flake from panel (a). The thickness of the particular flake is 4.2 nm. (c–j) Optical images of flakes with different thickness and a colorbar with the colors of flakes with thickness up to 110 nm. The scale bars are 5 μm.