ASOCIACIÓN ESPAÑOLA DEL VACIO Y SUS APLICACIONES
INSTITUTO DE CIENCIA DE MATERIALES DE MADRID - CSIC

ASEVA

IRNASA

CSIC

CSIC

CSIC

ASEVA WORKSHOP 2009

COST Action CM0601: Electron Controlled Chemical Lithography (ECCL)
Third meeting of Working Group 3
Chemical control by scanning tunnelling microscopy
FINAL PROGRAMME

Arrival: Sunday, July 26
Workshop days: Monday 27 through Wednesday 29
Departure: Wednesday 29, after breakfast

www.icmm.csic.es Last Revision 24-06-09