Study of the formation mechanism of hierarchical silicon structures produced by sequential ion beam irradiation and anodic etching

In a collaboration with the Autonomous University of Madrid (Department of Applied Physics and the Center for Micro Analysis of Materials) and the Institut für Solarenergieforschung Hameln (ISFH) of Germany we have studied the formation of micropatterns combining nanostructured (porous) Si (NPSi) and bulk Si by a sequential process of selective high energy ion irradiation and anodic etching.

E. Punzón Quijorna, S. Kajari-Shrönder, F. Agulló-Rueda, M. Manso Silván, R. J. Martín Palma, P. Herrero Fernández, V. Torres-Costa, and A. Climent, “Study of the formation mechanism of hierarchical silicon structures produced by sequential ion beam irradiation and anodic etching,” Vacuum 138, 238–243 (2017).

Esta entrada fue publicada en HRTEM, ion irradiation, microscopy, nanocharacterization, nanoscience, nanotechnology, Raman spectroscopy, silicon. Guarda el enlace permanente.

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